USPEKHI PRIKLADNOI FIZIKI
(ADVANCES IN APPLIED PHYSICS)
THE SCIENTIFIC AND TECHNICAL JOURNAL
| 2020, Vol. 8, No. 5 | Founded in 2013 | Moscow |
CONTENTS
| GENERAL PHYSICS | ||
|
V. A. Iodis
The pressure drop in the condensation process of vapors in micro-, mini- and micro-channels (a review) | 315 | |
| PLASMA PHYSICS AND PLASMA METHODS | ||
|
A. A. Bogdanov, S. V. Gavrish, A. M. Martsinovsky, and I. I. Stolyarov
Plasma diagnostics of high-current cesium discharge using the recombination continuum | 326 | |
| PHOTOELECTRONICS | ||
|
A. A. Lopukhin, K. O. Boltar, P. V. Vlasov, V. V. Eroshenkov, V. F. Chishko, N. F. Koschavtsev, and N. A. Larionov
Optimization of Photosensitive Layer Thickness in InSb FPA | 334 | |
|
N. I. Iakovleva
Estimation of the maximum distance to observation objects using a staring FPA | 341 | |
|
M. V. Trigub, D. V. Shiyanov, P. V. Khrabrov, and I. D. Burlakov
Active optical systems with brightness amplifiers in the short-wave IR range | 351 | |
| PHYSICAL SCIENCE OF MATERIALS | ||
|
R. V. Gorchakov, O. Yu. Kovalenko, Yu. A. Zhuravleva, and S. A. Mikaeva
Mathematical modeling of temperature dependences of fluoride temperature conductivity calcium mixtured with yttrium and neodium triphoride | 358 | |
|
A. V. Trukhachev, N. S. Trukhacheva, M. V. Sednev, and R. M. Aleev
Method for monitoring contamination of the semiconductor surface wafer by measuring the roughness | 364 | |
|
V. G. Kostishin, A. Yu. Mironovich, R. I. Shakirzyanov, I. M. Isaev, and A. A. Sergienko
Technological methods and mechanisms of magnetic texture formation in M-type hexaferrite films during their vacuum deposition (a review) | 370 |
Contents of another issues